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Impact of Substrate Modes on mTRL-Calibrated CPW Measurements in G Band

G.N. Phung1, F.J. Schmückle1, R. Doerner1, W. Heinrich1, T. Probst2, U. Arz2

Published in:

48th European Microwave Conference (EuMC 2018), Madrid, Spain, Sep. 25-27, pp. 194-197 (2018).

Abstract:

On-wafer measurements at microwave and mm-wave frequencies require reliable calibration processes to deduct unwanted effects such as the impact of probe, the wafer environment, and the instrumentation equipment itself. However, with increasing frequencies the calibrated results become more and more sensitive to parasitic effects such as radiation, multi-mode propagation, and substrate modes. This paper investigates their influence when using a typical coplanar waveguide (CPW) calibration substrate at G band. The goal of this paper is to clarify the role of substrate modes and to quantify how they affect multiline Thru-Reflect Line (mTRL) calibration.

1 Ferdinand Braun Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH), Gustav-Kirchhoff-Straße 4, 12489 Berlin, Germany
2 Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany

Keywords:

on-wafer probes, coplanar waveguides (CPW), substrate modes, calibration.

Copyright Publisher version:
© 2018 EuMA. All rights reserved. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the EuMA.

Copyright Author version:
This is an author-created, un-copyedited version of the article G.N. Phung, F.J. Schmückle, R. Doerner, W. Heinrich, T. Probst, and U. Arz, “Impact of Substrate Modes on mTRL-Calibrated CPW Measurements in G Band,” in Proc. of the 48th European Microwave Conference (EuMC), Madrid, Spain, Sep. 2018, pp. 194-197.
Copyright © 2018 EuMA. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the EuMA.
The definitive publisher-authenticated version is available online at:
https://ieeexplore.ieee.org/document/8541813

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