IWN 2018

conference: 11.-16.11.2018 Kanazawa (Japan)

The FBH presents current research at the International Workshop on Nitride Semiconductors. Conference contributions with FBH participation:

  •  Growth and characterization of C-doped GaN
  • Displacement Talbot Lithography for nano-engineering of III-nitride materials
  • Optimizing free carrier compensation in HVPE and MBE epitaxial GaN films
  • Degradation of AlGaN-based metal-semiconductor-metal photodetectors
  • Physical model for the microstructural evolution in epitaxial AlN on sapphire uponhigh-temperature annealing
  • Analysing extended defects in AlN and AlGaN quantum well structures grown on patterned sapphire substrates
  • Impact of intermediate high temperature annealing on the properties of MOVPE grown AlN / sapphire templates
  • Polarization fields in c-plane GaN /AlxGa1-x N/GaN quantum wells determined by capacitance-voltage-measurements
  • Investigation of the optical polarization of AlGaN multiple quantum wells using photoluminescence spectroscopy
  • Impact of temperature and current density on the degradation behavior of UVB LEDs
  • Spectrally and spatially resolved micro-electroluminescence investigation of degradation effects in UV-B LEDs
  • Temperature-dependent electroluminescence studies of AlGaN-based deep UV LEDs
  • High power UVB light emitting diodes with optimized n-contact layers
  • AlGaN-based deep UV LEDs grown on sputtered and high temperature annealed AlN/sapphire
  • Exploring the Wavelength Limits of AlGaN-Based Deep UV LEDs
  • Poster: UVB LED with narrow emission angle using advanced silicon-based reflector package and Fresnel lens
  • Poster: TCAD of AlGaN/GaN HFET load pull measurements
  • Poster: Collective behavior of injected excitons in GaN-based multi-quantum wells at threshold

conference-website