High-performance ion implantation – the basis for innovative semiconductor devices
The Berlin-based Ferdinand-Braun-Institut (FBH) recently put a sophisticated ion implanter system from High Voltage Engineering Europa B.V. into operation. The highly versatile tool extends the technological capabilities of FBH for in-house research and customer processes. With three different ion sources and the ability to heat substrates, the implanter is ideally suited for the development of innovative semiconductor devices.
