Improvement of Uniformity of Photoresist Ashing for a Half-Inch Wafer with Double U-Shaped Antenna Structure using a Microwave Excited Water Vapor Plasma

FBH seminar: 20.06.2025

A close-up of a microphone with the words "FBH seminar" beside it, set against a soft, blurred background. The image conveys the idea of a presentation or discussion setting.

Scientists will present the latest research findings on the following topic:

Improvement of Uniformity of Photoresist Ashing for a Half-Inch Wafer with Double U-Shaped Antenna Structure using a Microwave Excited Water Vapor Plasma
Prof. Tatsuo Ishijima, Kanazawa University Japan

The event will take place on 20.06.2025 from 11:00 to 12:00 at the Ferdinand-Braun-Institut, Gustav-Kirchhoff-Str. 4, 12489 Berlin, seminar room 1 + 2.

You are cordially invited!