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Modelling of a miniature microwave driven nitrogen plasma jet and comparison to measurements

M. Klute1, E. Kemaneci1, H.-E. Porteanu2, I. Stefanovic3, W. Heinrich2, P. Awakowicz4 and R.P. Brinkmann1

Published in:

Plasma Sources Sci. Technol., vol. 30, no. 6, pp. 065014, doi:10.1088/1361-6595/ac04bc (2021).

Abstract:

The MMWICP (miniature microwave ICP) is a new plasma source using the induction principle. Recently Klute et al presented a mathematical model for the electromagnetic fields and power balance of the new device. In this work the electromagnetic model is coupled with a global chemistry model for nitrogen, based on the chemical reaction set of Thorsteinsson and Gudmundsson and customized for the geometry of the MMWICP. The combined model delivers a quantitative description for a non-thermal plasma at a pressure of p = 1000 Pa and a gas temperature of Tg = 650-1600 K. Comparison with published experimental data shows a good agreement for the volume averaged plasma parameters at high power, for the spatial distribution of the discharge and for the microwave measurements. Furthermore, the balance of capacitive and inductive coupling in the absorbed power is analyzed. This leads to the interpretation of the discharge regime at an electron density of ne</sub  ≈ 6.4 × 1018 m-3 as E/H-hybridmode with an capacitive and inductive component.

1 Theoretical Electrical Engineering, Ruhr University Bochum, Germany
2 Microwave Department, Ferdinand-Braun-Institut, Berlin, Germany
3 Institute of Technical Sciences, Serbian Academy of Sciences and Arts, Belgrade, Serbia
4 Electrical Engineering and Plasma Technology, Ruhr University Bochum, Germany

Keywords:

plasma jet, miniature, microwave, nitrogen, inductively

© 2021 The Author(s). Published by IOP Publishing Ltd Printed in the UK.
Original content from this work may be used under the terms of the Creative Commons Attribution 4.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.

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