Press release: 26.05.2021

High-performance ion implantation – the basis for innovative semiconductor devices

The Berlin-based Ferdinand-Braun-Institut (FBH) recently put a sophisticated ion implanter system from High Voltage Engineering Europa B.V. into operation. The highly versatile tool extends the technological capabilities of FBH for in-house research and customer processes. With three different ion sources and the ability to heat substrates, the implanter is ideally suited for the development of innovative semiconductor devices.
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