Silicon Micromachined RF MEMS Resonators
K.M. Strohm1, F.J. Schmückle2 , B. Schauwecker1, J.F. Luy1, W. Heinrich2
Published in:
IEEE MTT-S Int. Microwave Symp. Dig., pp. 1209-1212 (2002).
Abstract:
A new resonator concept based on three dimensional (3D) high resistivity silicon substrate filled cavity resonators is investigated. Fabrication is done using micro-machining technologies. Two types of resonators are investigated, an "open-end" patch resonator and a "short circuit via" resonator. Both types show good agreement in simulated and measured resonance frequencies (within 2%). However, measured quality factors (50-70) are still lower than the simulated values and theoretical expectations.
1 DaimlerChrysler Research Center, D-89081 Ulm, Germany
2 Ferdinand-Braun-Institut für Höchstfrequenztechnik, D-12489 Berlin, Germany
© 2002 The IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Full version in pdf-format.
<img src="../../../images/space.gif" width="10" height="1" border="0" alt="" />