980-nm DBR lasers using higher order gratings defined by i-line lithography
J. Fricke, H. Wenzel, M. Matalla, A. Klehr and G. Erbert
Published in:
Semicond. Sci. Technol., vol. 20, no. 11, pp. 1149-1152 (2005).
Abstract:
We report on the simultaneous definition and fabrication of Bragg gratings and ridge waveguides using wafer stepper lithography and reactive ion etching, respectively. Single-longitudinal mode emission from two-section ridge-waveguide distributed feedback lasers with sixth and seventh order gratings will be reported. This technology enables a cheap fabrication of wavelength-stabilized lasers and a simple variation of the parameters of the gratings on the wafer using optical lithography.
Ferdinand-Braun-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Straße 4, D-12489 Berlin, Germany
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