Recent Progress in Photonic Processing of Metal-Oxide Transistors

E. Yarali1, C. Koutsiaki2, H. Faber1, K. Tetzner3, E. Yengel1, P. Patsalas4, N. Kalfagiannis2, D.C. Koutsogeorgis2, and T.D. Anthopoulos1

Published in:

Adv. Funct. Mater., vol. 30, no. 20, Special Issue: Emerging Thin-Film Transistor Technologies and Applications, pp. 1906022 (2020).

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Abstract:

Over the past few decades, significant progress has been made in the field of photonic processing of electronic materials using a variety of light sources. Several of these technologies have now been exploited in conjunction with emerging electronic materials as alternatives to conventional hightemperature thermal annealing, offering rapid manufacturing times and compatibility with temperature-sensitive substrate materials among other potential advantages. Herein, recent advances in photonic processing paradigms of metal-oxide thin-film transistors (TFTs) are presented with particular emphasis on the use of various light source technologies for the photochemical and thermochemical conversion of precursor materials or postdeposition treatment of metal oxides and their application in thin-film electronics. The pros and cons of the different technologies are discussed in light of recent developments and prospective research in the field of modern large-area electronics is highlighted.

1 King Abdullah University of Science and Technology (KAUST), KAUST Solar Center (KSC), Thuwal 23955, Saudi Arabia
2 School of Science and Technology, Nottingham Trent University, NG11 8NS, Nottingham, UK
3 Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Straße 4, 12489 Berlin, Germany
4 Department of Physics, Aristotle University of Thessaloniki, GR-54124 Thessaloniki, Greece

Keywords:

flash lamps; laser processing; metal oxides; photonic processing; thin-film transistors