Riber and TRUMPF collaborating on epi processes for next-gen high-power lasers

Riber S.A. of Bezons, France, which manufactures molecular beam epitaxy (MBE) systems as well as evaporation sources and effusion cells, has signed an agreement with Germany-based TRUMPF to collaborate on epitaxy process technologies for next-generation III-V high-power laser devices. This follows process qualification at the Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH) of Berlin, Germany.
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Quelle: Semiconductor Today, 19.04.2012