Publikationen

Variation of refractive index step of 635 nm ridge waveguide lasers for optimized index guiding

D. Feise, G. Blume, Chr. Kaspari, K. Paschke, and G. Erbert

Published in:

Proc. SPIE, vol. 7918, no. 791812 (2011).

Abstract:

We report on experimental and theoretical investigations concerning the influence of the ridge etching depth and the corresponding effective refractive index step on the electro-optical properties of ridge waveguide diode lasers emitting near 635 nm. We observe a suppression of higher order lateral modes for larger steps in effective index leading to a more homogeneous far field, as required e.g. in "flying spot" display applications. With the proper design choice, a total optical output power of P > 200 mW at 638 nm and 15°C and a beam quality M2 < 2 could be achieved.

Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Strasse 4, 12489 Berlin, Germany

Keywords:

ridge waveguide laser, diode laser, red-emitting, beam quality.

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