UV Laser Processing for Semiconductor Devices
O. Krügera, and R. Grundmüllerb
Published in:
Laser Technik Journal, vol. 10, no. 5, pp. 26-30 (2013).
Abstract:
The application of reliable laser sources is well-established in several fields of industry including automotive, electronics, and medical manufacturing on macro, micro, and even nanometer scales [1]. In modern semiconductor technology, silicon is the dominating material. Further materials like gallium nitride (GaN) and silicon carbide (SiC) allow for higher operating frequencies and power levels, i. e., high-speed electronics and high-power applications. However, their chemical and physical properties do not only allow extending the limits of silicon-based device performance, but also call for alternative methods of processing.
a Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Straße 4, 12489 Berlin, Germany
b InnoLas Systems GmbH, Justus-von-Liebig-Ring 8, 82152 Krailling, Germany
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