R. Doerner

Published in:

69th ARFTG Conf., Honolulu, HI, Jun. 8, pp. 86-89 (2007).

Abstract:

This paper presents a comparison of two well-known two-port wafer-level calibration methods, the enhanced linereflect- reflect-match (eLRRM) and the advanced line-reflectmatch (LRM+) approach. Both methods are based on the seventerm error model and involve self-calibration techniques. The reference impedance is established by the match standard. Therefore, accuracy is strongly influenced by the description of this standard. Experimental results for calibration accuracy up to 110 GHz are given.

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