Advanced thin film technology for ultrahigh resolution X-ray microscopy
J. Vila-Comamalaa, K. Jefimovsb, J. Raabea, T. Pilvic, R. H. Finkd, M. Senonere, A. Maaßdorff, M. Ritalac, C. Davida
Published in:
Ultramicroscopy, vol. 109, no. 11, pp. 1360-1364 (2009).
Abstract:
Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metalorganic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10nm in width were resolved.
a Paul Scherrer Institut, CH-5232 Villigen, Switzerland
b EMPA, CH-8600 Dübendorf, Switzerland
c Department of Chemistry, University of Helsinki, FI-00014, Finland
d ICMM and IZ-ICP, Friedrich-Alexander Universität, D-91058 Erlangen, Germany
e BAM Bundesanstalt für Materialforschung und -prüfung, D-12200 Berlin, Germany
f Ferdinand-Braun-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Straße 4, 12489 Berlin, Germany
Keywords:
X-ray microscopy, X-ray diffractive optics, Electron-beam lithography, Atomic layer deposition
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