980-nm DBR lasers using higher order gratings defined by i-line lithography

Published in:
Semicond. Sci. Technol. 20 (2005) 1149-1152.
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Abstract:
We report on the simultaneous definition and fabrication of Bragg gratings and ridge waveguides using wafer stepper lithography and reactive ion etching, respectively. Single-longitudinal mode emission from two-section ridge-waveguide distributed feedback lasers with sixth and seventh order gratings will be reported. This technology enables a cheap fabrication of wavelength-stabilized lasers and a simple variation of the parameters of the gratings on the wafer using optical lithography.

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