Silicon Micromachined RF MEMS Resonators
K.M. Strohm1, F.J. Schmückle2, B. Schauwecker1, J.F. Luy1, W. Heinrich2
1 DaimlerChrysler Research Center, D-89081 Ulm, Germany
2 Ferdinand-Braun-Institut für Höchstfrequenztechnik, D-12489 Berlin, Germany
Published in:
IEEE MTT-S Int. Microwave Symp. Dig., 2002, pp. 1209-1212.
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Abstract:
A new resonator concept based on three dimensional (3D) high resistivity silicon substrate filled cavity resonators
is investigated. Fabrication is done using micro-machining technologies. Two types of resonators are investigated,
an "open-end" patch resonator and a "short circuit via" resonator. Both types show good
agreement in simulated and measured resonance frequencies (within 2%). However, measured quality factors (50-70)
are still lower than the simulated values and theoretical expectations.
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